Automated yield monitoring and control
US8206123B2 · kind B2 · utility
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14References
12Claims
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Key dates
| Filing date | Jun 5, 2007 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Jan 2, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86002
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system is adapted to automatically maintain a desired yield level for a slurry flow. Measurements of the electrical conductivity of a slurry are taken and corrected for the effects of temperature and pressure. The corrected conductivity measurements are used to arrive at a value for system yield. The system automatically determines if the yield is too high or too low relative to a desired level, and controls the rate at which accelerator is added to the slurry in order to increase or decrease yield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.