Fluoride ion cleaning method
US8206488B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 31, 2008 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Oct 22, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2257/2047
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A fluoride ion cleaning method includes generating hydrogen fluoride (HF) gas in-situ in a cleaning retort; contacting a part in need of cleaning with the generated HF gas; scrubbing an initial effluent stream in-situ to substantially remove residual HF gas therefrom; and passing the scrubbed effluent gas stream out of the cleaning retort. In an exemplary method, a liquid or gaseous halogenated feedstock is introduced into a cleaning retort; hydrogen gas is introduced into the cleaning retort, HF gas is generated by a reaction of the feedstock with hydrogen gas at a sufficient temperature. In an exemplary method, only HF gas generated in-situ or reconstituted in-situ is utilized in the cleaning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.