Material deposition techniques for control of solid state aperture surface properties
US8206568B2 · kind B2 · utility
21Cited by
20References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2004 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Jun 8, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y15/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention provides a method for molecular analysis. In the method, sidewalls are formed extending through a structure between two structure surfaces, to define an aperture. A layer of material is deposited on the aperture sidewalls and the two structure surfaces. The aperture with the deposited material layer is then configured in a liquid solution with a gradient in a chemical potential, between the two structure surfaces defining the aperture, that is sufficient to cause molecular translocation through the aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.