Process for preparing stable photoresist compositions
US8207278B2 · kind B2 · utility
1Cited by
3References
1Claims
0Family size
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Key dates
| Filing date | Dec 9, 2010 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Dec 9, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.