Charged particle beam drawing apparatus and proximity effect correction method thereof
US8207514B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2010 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Dec 18, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.