Patent · US Active

SiO2 slurry for the production of quartz glass as well as the application of the slurry

US8209998B2 · kind B2 · utility

4Cited by

11References

21Claims

0Family size

Assignee

HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

Waltraud Werdecker · Hanau, DE
Norbert Traeger · Maintal, DE
Juergen Weber · Erlangen, DE

Key dates

Filing date	Dec 29, 2011
Grant date	Jul 3, 2012
Priority date	—
Expiry date	Dec 29, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2218/11
WIPO fieldOther special machines
WIPO sectorMechanical engineering

Abstract

SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm. The largest volume fraction is SiO2 particles with particle sizes of 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm constituting 0.2-15% volume by weight of the entire solids content. To prepare the slurry for use and optimize its flow behavior for later processing by dressing or pouring the slurry mass, and for later drying and sintering without cracks, the slurry has SiO2 particles with a multimodal distribution of particle sizes, with a first maximum in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and an 83%-90% solids content by weight of the SiO2 particles and the SiO2 nanoparticles together.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.