Vacuum control system and vacuum control method
US8210196B2 · kind B2 · utility
8Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2011 |
| Grant date | Jul 3, 2012 |
| Priority date | — |
| Expiry date | Mar 10, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/777
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A vacuum control system using a vacuum pump to control a vacuum pressure and a flow of a processing gas in a vacuum chamber. The vacuum control system includes: a plurality of vacuum control valves, each of the valves being connected between each of a plurality of gas discharge ports and the vacuum pump; a pressure measurement unit configured to measure the vacuum pressure of the processing gas supplied to the object; and a controller configured to manipulate respective openings of the valves in accordance with the measured vacuum pressure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.