Patent · US Active

Apparatuses and methods for deposition of material on surfaces

US8211235B2 · kind B2 · utility

6Cited by

30References

15Claims

0Family size

Assignee

Picosun Oy · FI

Inventors

Sven Lindfors · Espoo, FI
Juha A. Kustaa-Adolf Poutiainen · Helsinki, FI

Key dates

Filing date	Mar 4, 2005
Grant date	Jul 3, 2012
Priority date	—
Expiry date	Jul 11, 2028

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/52
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

An apparatus for depositing conformal thin films by sequential self saturating chemical reactions on heated surfaces is disclosed. The apparatus comprises a movable single or dual-lid system that has a substrate holder attached to a reaction chamber lid. In other embodiments, the apparatus comprises an exhaust flow plug, a gas distribution insert, a local heater or a minibatch system. Various methods suitable for ALD (Atomic Layer Deposition) are also enclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.