Patent · US Active

Solid inks for printed masks

US8211617B2 · kind B2 · utility

1Cited by

14References

14Claims

0Family size

Assignee

Palo Alto Research Center Incorporated · US

Inventors

Norine E. Chang · Menlo Park, US
C. Wayne Jaeger · Beaverton, US
Scott Limb · Palo Alto, US
Eric J. Shrader · Belmont, US
Francisco E. Torres · San Jose, US
Kris Schmidt · San Fernando, US

Key dates

Filing date	Aug 17, 2009
Grant date	Jul 3, 2012
Priority date	—
Expiry date	Aug 28, 2030

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC09D11/36
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

A printed mask derived from a composition comprised of at least one compound including at least one alkaline-hydrolyzable group, and at least one compound including at least one ethylene oxide group. The printed mask is removable using an alkaline solution in about 30 seconds or less.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.