Nanopin manufacturing method and nanometer sized tip array by utilizing the method
US8216480B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2008 |
| Grant date | Jul 10, 2012 |
| Priority date | — |
| Expiry date | May 11, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/876
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods to manufacture metal nanopins and metal oxide nanopins are disclosed. Metal nanopins are fabricated on a metal foil by capillaritron plasma source dry etching. The aspect ratio and the density of metal nanopins are controlled by adjusting the temperature of the metal foil during ion beam dry etching. The end radius of metal nanopins less than 10 nm and the aspect ratio of metal nanopins between 25 and 30 can be achieved. Besides, metal oxide nanopins are fabricated by ion implantation and thermal oxidation. The metal foil is implanted with ions and then thermally oxidized to form the metal oxide nanopins. It shows that the metal oxide nanopins fabricated with oxygen implantation exhibit better field emission properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.