Patent · US Active

Methods for elimination or reduction of oxide and/or soot deposition in carbon containing layers

US8216639B2 · kind B2 · utility

0Cited by

8References

20Claims

0Family size

Assignee

Qimonda AG · DE

Inventors

Maik Liebau · Dresden, DE
Franz Kreupl · Mountain View, US
Georg Duesberg · Blackrock, IE
Eugen Unger · Augsburg, DE

Key dates

Filing date	Dec 16, 2005
Grant date	Jul 10, 2012
Priority date	—
Expiry date	Sep 9, 2030

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/26
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

One embodiment of the present invention provides a method for the deposition of a Carbon containing layer on a Silicon surface wherein a (i) substantially Silicon-oxide-free or reduced oxide interface results between Silicon and the Carbon containing layer during the deposition. In another embodiment, the present invention provides a method for deposition of a Carbon containing layer wherein the deposition process is substantially soot (particle)-free or reduction of soot.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.