Purification of an H2/CO mixture with heater skin temperature control
US8221526B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2007 |
| Grant date | Jul 17, 2012 |
| Priority date | — |
| Expiry date | Feb 5, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/151
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to a method for purifying or separating a supply gas flow containing at least one impurity, in which: a) said supply gas flow is contacted with a first adsorbent for the adsorption-removal of at least one said impurity; b) recovering said purified or separated gas; c) heating a regeneration gas containing at least hydrogen (H2) and carbon monoxide (CO) using a heater having a skin temperature (T1) of between 150° C. and 200° C. during the gas heating phase; and d) periodically regenerating the adsorbent of step a) with the regeneration gas heated during step c) at a regeneration temperature (T2) such that: T2=T1−ΔT with 5° C.<ΔT<50° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.