Patent · US Active

Purification of an H2/CO mixture with heater skin temperature control

US8221526B2 · kind B2 · utility

0Cited by
3References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 11, 2007
Grant dateJul 17, 2012
Priority date
Expiry dateFeb 5, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P20/151
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The invention relates to a method for purifying or separating a supply gas flow containing at least one impurity, in which: a) said supply gas flow is contacted with a first adsorbent for the adsorption-removal of at least one said impurity; b) recovering said purified or separated gas; c) heating a regeneration gas containing at least hydrogen (H2) and carbon monoxide (CO) using a heater having a skin temperature (T1) of between 150° C. and 200° C. during the gas heating phase; and d) periodically regenerating the adsorbent of step a) with the regeneration gas heated during step c) at a regeneration temperature (T2) such that: T2=T1−ΔT with 5° C.<ΔT<50° C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.