Microwave plasma CVD of NANO structured tin/carbon composites
US8221853B2 · kind B2 · utility
2Cited by
3References
21Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 28, 2009 |
| Grant date | Jul 17, 2012 |
| Priority date | — |
| Expiry date | Jun 1, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249967
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for forming a graphitic tin-carbon composite at low temperatures is described. The method involves using microwave radiation to produce a neutral gas plasma in a reactor cell. At least one organo tin precursor material in the reactor cell forms a tin-carbon film on a supporting substrate disposed in the cell under influence of the plasma. The three dimensional carbon matrix material with embedded tin nanoparticles can be used as an electrode in lithium-ion batteries.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.