Oxyfluoride in the form of a film and preparation method
US8221902B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 13, 2006 |
| Grant date | Jul 17, 2012 |
| Priority date | — |
| Expiry date | Apr 18, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24999
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention relates to a nanostructured porous oxyfluoride film deposited onto a substrate, to a method for its production, and also to various applications.The oxyfluoride has a porous semicrystalline structure and a refractive index of 1.08 to 1.25, measured in the visible range for a relative humidity level below 80%. Its chemical composition corresponds to the formula (Mg(1−x)Cax)(1−y)MyF(2+(n−2)y−2z−t)Oz(OH)tM′w in which n is the valency of M, n being 1 to 4, M represents at least one element chosen from Al, Si, Ge and Ga, M′ represents at least one element chosen from the group composed of Co, Cr, Ni, Fe, Cu, Sb, Ag, Pd, Cd, Au, Sn, Pb, Ce, Nd, Pr, Eu, Yb, Tb, Dy, Er and Gd, and 0≦w<0.1; 0≦x≦1; 0≦y≦0.5; z<1; z+t>0 and t<2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.