Method for producing fine structure
US8221963B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2008 |
| Grant date | Jul 17, 2012 |
| Priority date | — |
| Expiry date | Dec 5, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for producing a fine structure includes: (a) forming a photosensitive film to cover a plurality of first convex portions formed in at least one surface of a substrate; (b) arranging liquid to cover the photosensitive film on the at least one surface of the substrate; (c) arranging a transparent parallel plate such that the parallel plate opposes the substrate via the liquid; (d) generating interference field by a laser beam to irradiate the interference field onto the photosensitive film via the parallel plate and the liquid; (e) removing the liquid and the parallel plate to develop the photosensitive film so as to form a photosensitive film pattern; and (f) etching the substrate using a mask of the photosensitive film pattern to form a plurality of fine convex portions smaller than the first convex portions on the at least one surface of the substrate. In the method, the liquid arranged at step (b) has a refractive index larger than 1 and equal to or smaller than a refractive index of the photosensitive film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.