Inductively-coupled plasma device
US8222822B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 27, 2009 |
| Grant date | Jul 17, 2012 |
| Priority date | — |
| Expiry date | Jan 18, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4697
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma device configured to receive ionizable media is disclosed. The plasma device includes a first pair of dielectric substrates each having an inner surface and an outer surface. The first pair of dielectric substrates is disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another. The device also includes a first pair of spiral coils each disposed on the inner surface of the dielectric substrates. The first pair of spiral coils is configured to couple to a power source and configured to inductively couple to an ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.