Patent · US Active

Three-dimensional wiping substrate and method therefor

US8225729B2 · kind B2 · utility

4Cited by
103References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 16, 2008
Grant dateJul 24, 2012
Priority date
Expiry dateMar 1, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24033
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

A planar substrate has a moisture activated shrinking filament applied thereon. When wetted, the shrinking filament shrinks and causes the planar substrate to gather and pucker. The planar substrate with the filament thereon may be compressed into a compact shape when in a dry state.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.