Optical recording medium, and sputtering target and method for producing the same
US8227067B2 · kind B2 · utility
1Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Jan 28, 2008 |
| Grant date | Jul 24, 2012 |
| Priority date | — |
| Expiry date | Sep 16, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An optical recording medium containing a substrate and a recording layer over the substrate, wherein the recording layer primarily contains Bi and O, and further contains B and at least one element X selected from Ge, Li, Sn, Cu, Fe, Pd, Zn, Mg, Nd, Mn and Ni, and a sputtering target containing Bi, B and at least one element X selected from Ge, Li, Sn, Cu, Fe, Pd, Zn, Mg, Nd, Mn and Ni.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.