Patent · US Active

Pattern aligning method, verifying method, and verifying device

US8229250B2 · kind B2 · utility

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6References
22Claims
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Key dates

Filing dateFeb 10, 2009
Grant dateJul 24, 2012
Priority date
Expiry dateApr 22, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06V10/757
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A pattern alignment method performs alignment of the comparison source pattern or the comparison target pattern that has been subjected to the angle-scale conversion with the comparison source pattern. Angular deviations and scale factors between the comparison source pattern and the comparison target pattern are computed separately, after angle and scale conversion, the measured template matching is performed. Therefore, parallel-displacement alignment can be made faster and precise alignment is possible. Template matching processing can be minimized, and aligning can be performed precisely and rapidly.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.