Patent · US Active

Filter arrangement for cleaning process gases contaminated with particles and process for cleaning filter units of such a filter arrangement

US8231715B2 · kind B2 · utility

4Cited by

13References

19Claims

0Family size

Assignee

Hüttlin GmbH · DE

Inventors

Martin Gross · Boone, US
Uwe Schmidt
Christoph Macho · Steinen, DE
Marcus Knöll · Bad Kötzting, DE

Key dates

Filing date	Sep 3, 2008
Grant date	Jul 31, 2012
Priority date	—
Expiry date	Mar 31, 2029

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB01D46/69
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A filter arrangement, for cleaning gases contaminated with particles, has at least one filter unit with an exterior and an interior filter (3.1, 3.2), wherein the exterior and interior filters can be moved relative to each other, thereby exposing an opening (3.4) in the bottom regions thereof. This allows cleaning of filter units at the site of the filter units without disassembly of the same (cleaning in place—CIP). A method for cleaning is provided in that the region of the filter unit on the clean gas side including introducing a fluid sprayed via a cleaning lance protruding into the clean gas region while exposing a gap (3.4) in the bottom region of the exterior and interior filters.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.