Shutter system
US8232539B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 8, 2008 |
| Grant date | Jul 31, 2012 |
| Priority date | — |
| Expiry date | Mar 22, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/564
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a shutter system operable between an open position, and a closed position operable to avoid unintended exposure of a surface to radiant flux, wherein said shutter system comprises at least one pair of shields, and an axis for each shield, wherein a first axis is connected to an end part of a first shield, and coincides with the turning axis of the first shield, wherein a second axis, in the shape of an angled arm, is connected to an end part of a second shield and the turning axis of the second shield is parallel to the turning axis of said first shield and is arranged at a distance from the second shield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.