Plasma producing apparatus and method of plasma production
US8232729B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2007 |
| Grant date | Jul 31, 2012 |
| Priority date | — |
| Expiry date | Sep 15, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2465
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
For production of plasma from a medium gas mass in an elongated shape, electric field forming elements 3, 4 that form an electric field in the medium gas mass are provided. The electric field forming elements form an electric field so that partial discharge occurs from the electric field forming elements toward both sides in the longitudinal direction of the medium gas mass. Accordingly, plasma 5 is produced from the medium gas mass. The medium gas mass is formed by, for example, gas supply members 1,2 that guide medium gas, through an internal hollow, to the electric field forming elements. An electric field forming area includes, for example, at least one high-potential electrode 3 and a voltage applying unit 4 that applies a voltage to the high-potential electrode. Plasma limited in medium gas can be produced with high energy efficiency stably over a wide range of parameters through a simple configuration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.