Method for manufacturing optical element
US8233114B2 · kind B2 · utility
7Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2011 |
| Grant date | Jul 31, 2012 |
| Priority date | — |
| Expiry date | Feb 7, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical element manufacturing method according to the present invention includes: disposing a mask on a transparent photosensitive resin; patterning said transparent resin by applying an exposure light to said transparent photosensitive resin through said mask to form a transparent layer; forming a light absorbing layer by filling a gap in the transparent layer with a black curable resin; and illuminating a mask surface of the mask with the exposure light at an angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.