Patent · US Active

Electron-beam-assisted EEM method

US8235769B2 · kind B2 · utility

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20Claims
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Key dates

Filing dateAug 3, 2006
Grant dateAug 7, 2012
Priority date
Expiry dateDec 4, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S451/908
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process. After the exposure of the workpiece in its working face to an electron beam to conduct modification so that the machining speed of the surface layer part in the working face is substantially even, ultraprecision smoothening is carried out by working process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.