Antireflection structure and manufacturing method thereof
US8236433B2 · kind B2 · utility
23Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2008 |
| Grant date | Aug 7, 2012 |
| Priority date | — |
| Expiry date | Oct 14, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.