Energy sources for curing in an imprint lithography system
US8237133B2 · kind B2 · utility
5Cited by
11References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2009 |
| Grant date | Aug 7, 2012 |
| Priority date | — |
| Expiry date | Apr 28, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an imaging unit monitoring elements of the imprint lithography system. Each energy source is configured to provide energy along a path to solidify polymerizable material on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.