Thermal control of optical filter with local silicon frame
US8238015B2 · kind B2 · utility
1Cited by
1References
7Claims
0Family size
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Key dates
| Filing date | May 6, 2011 |
| Grant date | Aug 7, 2012 |
| Priority date | — |
| Expiry date | May 6, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/1074
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method comprising generating an optical beam with a laser, filtering the optical beam to select a desired wavelength with an etalon positioned in a path of the optical beam, heating the etalon to an operational temperature using a heater, monitoring the operational temperature of the etalon with a resistive thermal device disposed in or on a thermally conductive frame bonded to the etalon, and applying feedback control of the heater based on the monitoring to select the desired wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.