Patent · US Active

Patterning methods and products

US8241841B2 · kind B2 · utility

0Cited by
0References
17Claims
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Assignee

Inventors

Key dates

Filing dateMar 24, 2005
Grant dateAug 14, 2012
Priority date
Expiry dateJan 29, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/8305
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention provides a process for producing a surface-modified layer system comprising a substrate (2) and a self-assembled monolayer (SAM) (1) anchored to its surface. The SAM (1) is comprised by aryl or rigid alicyclic moiety species. The process comprises providing a polymorphic SAM (1) anchored to the substrate (2), and thermally treating (4) the SAM to change from a first to a second structural form thereof. The invention also provides a thermolithographic form of process in which the thermal treatment (4) is used to transfer a pattern (3) to the SAM (1), which is then developed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.