Sidewall tracing nanoprobes, method for making the same, and method for use
US8245318B2 · kind B2 · utility
6Cited by
4References
22Claims
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Key dates
| Filing date | Jul 27, 2007 |
| Grant date | Aug 14, 2012 |
| Priority date | — |
| Expiry date | May 24, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q70/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Sidewall tracing nanoprobes, in which the tip shape of the nanoprobe Is altered so that the diameter or width of the very tip of the probe is wider than the diameter of the supporting stem. Such side protruding probe tips are fabricated by a subtractive method of reducing the stem diameter, an additive method of increasing the tip diameter, or sideway bending of the probe tip. These sidewall tracing nanoprobes are useful for inspection of semiconductor devices, especially to quantitatively evaluate the defects on the side wall of trenches or via holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.