Mirror arrangement of a laser processing system
US8246185B2 · kind B2 · utility
1Cited by
3References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 19, 2008 |
| Grant date | Aug 21, 2012 |
| Priority date | — |
| Expiry date | Feb 16, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0983
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A mirror arrangement for a laser processing system includes a mirror configured to deflect laser radiation incident on the mirror arrangement onto a workpiece. The mirror arrangement includes first, second, and third mirror regions. A surface of the third mirror region is parallel to or recessed from a direction of propagation of the laser radiation incident on the mirror arrangement such that the third mirror region forms a shadow zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.