Continual flow pin washer
US8246760B2 · kind B2 · utility
4Cited by
12References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2011 |
| Grant date | Aug 21, 2012 |
| Priority date | — |
| Expiry date | Sep 14, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2035/1037
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A multi-chambered deposition pin wash station is provided. The wash station includes a lower chamber and an upper drain basin connected by a plurality of wash tubes. Cleaning fluid is provided to the lower chamber and passes through the cleaning tubes into the upper drain basin. The cleaning tubes are adapted to clean a single deposition pin with a single tube per wash cycle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.