Optofluidic lithography system, method of manufacturing two-layered microfluidic channel, and method of manufacturing three-dimensional microstructures
US8246889B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Sep 8, 2009 |
| Grant date | Aug 21, 2012 |
| Priority date | — |
| Expiry date | Jun 3, 2030 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF15B15/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.