Method to form a photovoltaic cell comprising a thin lamina
US8247260B2 · kind B2 · utility
20Cited by
43References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 8, 2009 |
| Grant date | Aug 21, 2012 |
| Priority date | — |
| Expiry date | Jan 2, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.