Patent · US Active

Method for determining positions of structures on a mask

US8248618B2 · kind B2 · utility

2Cited by

7References

11Claims

0Family size

Assignee

Vistec Semiconductor Systems GmbH · DE

Inventors

Klaus Rinn · Heuchelheim, DE
Andreas Schaaf · Mittenaar, DE
Andre Schepp · Reiskirchen, DE

Key dates

Filing date	Jan 19, 2010
Grant date	Aug 21, 2012
Priority date	—
Expiry date	Dec 4, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/03
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for determining the positions of structures (3) on a mask (2) is disclosed. The method is implemented in a metrology tool (1) comprising a measurement table (20) which is movable in X-coordinate direction and Y-coordinate direction. A first intensity profile (IX) is recorded along a first measurement direction (MRX), which is parallel to the X-coordinate direction. A second intensity profile (IY) is recorded along a second measurement direction (MRY), which is parallel to the Y-coordinate direction. A two-dimensional position of a centre of gravity (S) with respect to the coordinate system of the metrology tool (1) is determined from the first intensity profile (IX) and the second intensity profile (IY).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.