Method for optical characterisation
US8248621B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 14, 2010 |
| Grant date | Aug 21, 2012 |
| Priority date | — |
| Expiry date | Dec 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/0846
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical characterization method of repeat units forming a diffraction structure, each repeat unit including a geometric pattern produced, at least in part, using a porous material, the method including: determining the geometric parameters of the patterns; performing a scatterometric acquisition using an optical measurement system of the experimental optical response of the diffraction structure placed in a chamber at a given pressure, a presence of an adsorbable gaseous substance in the chamber causing condensation of the adsorbable gaseous substance in a part of open pores of the patterns; and determining a theoretical optical response of the diffraction structure from the determined geometric parameters and by adjusting an optical index of the material of an area of each of the patterns, in which the adsorbable gaseous substance has condensed, to make a difference between the experimental response and the theoretical response less than or equal to a given threshold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.