Method for designing two-dimensional array overlay target sets and method and system for measuring overlay errors using the same
US8250497B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2009 |
| Grant date | Aug 21, 2012 |
| Priority date | — |
| Expiry date | Sep 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for designing a two-dimensional array overlay target set comprises the steps of: selecting a plurality of two-dimensional array overlay target sets having different overlay errors; calculating a deviation of a simulated diffraction spectra for each two-dimensional array overlay target set; selecting a sensitive overlay target set by taking the deviations of the simulated diffraction spectra into consideration; and designing a two-dimensional array overlay target set based on the structural parameters of the sensitive overlay target set.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.