Methods for nanowire alignment and deposition

US8252164B2 · kind B2 · utility

Assignees

• NANOSYS, INC. · US
• SHARP KABUSHIKI KAISHA · JP

Inventors

• Samuel Martin · Cupertino, US
• Xiangfeng Duan · Los Angeles, US
• Katsumasa Fujii · Nara, JP
• James M. Hamilton · Hawthorne, US
• Hiroshi Iwata · Nagaokakyo, JP
• Francisco Leon · Mountain View, US
• Jeffrey Miller · St. Augustine, US
• Tetsu Negishi · Chiyoda, JP
• Hiroshi Ohki · Tsuchiura, JP
• J. Wallace Parce · Palo Alto, US
• Cheri Pereira · Fremont, US
• Paul J. Schuele · Washougal, US
• Akihide Shibata · Nara, JP
• David Stumbo · Belmont, US
• Yasunobu Okada · Gifu, JP

Key dates

• Filing date: May 23, 2011
• Grant date: Aug 28, 2012
• Expiry date: May 23, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/883
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.