Patent · US Active

Hot melt compositions

US8252506B2 · kind B2 · utility

6Cited by
18References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 4, 2009
Grant dateAug 28, 2012
Priority date
Expiry dateSep 9, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/122
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

Hot melt compositions include acid waxes and acrylate functional monomers free of acid groups. Upon application of actinic radiation, the hot melt compositions cure to form and etch resist. The hot melt compositions may be used in the manufacture of printed circuit boards, optoelectronic and photovoltaic devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.