Photoactive compound and photosensitive resin composition comprising the same
US8252507B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 1, 2009 |
| Grant date | Aug 28, 2012 |
| Priority date | — |
| Expiry date | Jan 24, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/031
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.