Crystallization-free glass frit compositions and frits made therefrom for microreactor devices
US8252708B2 · kind B2 · utility
34Cited by
42References
6Claims
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Key dates
| Filing date | Mar 8, 2012 |
| Grant date | Aug 28, 2012 |
| Priority date | — |
| Expiry date | Mar 8, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01L3/5027
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A borosilicate glass composition suitable for manufacturing microreactor glass frits includes 12-22 mol % B2O3=12-22; 68-80 mol % SiO2; 3-8 mol % Al2O3, 1-8 mol % Li2O, and one of 0.5±0.1 mol % ZrO2 and 1.1±0.5 mol % F. After sintering a glass frit having the borosilicate glass composition, the glass frit has a surface crystalline layer of 30 μm or less or is amorphous throughout.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.