Optical characteristic mapping instrument
US8253087B2 · kind B2 · utility
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2References
50Claims
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Key dates
| Filing date | Aug 29, 2007 |
| Grant date | Aug 28, 2012 |
| Priority date | — |
| Expiry date | Jul 13, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J1/4257
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for measuring the wavefront characteristics of a powerful laser close to an emitting or transmitting surface of the laser. The system includes a beam sampler that has a sampling aperture for sampling radiation from a sampled area along the emitting or transmitting surface. The beam sampler includes a reflector for directing un-sampled radiation onto an absorber, which absorbs un-sampled radiation. Radiation sampled by the beam sampler is sensed using a sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.