Exposure device
US8253926B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 24, 2009 |
| Grant date | Aug 28, 2012 |
| Priority date | — |
| Expiry date | Jan 7, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure device for producing semiconductors and liquid crystals has an optical system capable of effectively using light generated without making a hole in a lamp discharge vessel when high energy laser light is supplied to it for emitting light, such as ultraviolet light. The exposure device has a light source for emitting ultraviolet light, a laser device for emitting laser light, an elliptical reflector for reflecting ultraviolet light emitted from the light source, and an optical system for directing light reflected by the elliptical reflector to an article to be treated via optical elements including a collimator lens and an integrator lens, and a beam splitter having a wavelength selecting ability provided in the optical path for light reflected by the elliptical reflector to allow laser light to be incident on the light source from and opening side of the elliptical reflector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.