Patent · US Active

Initiating laser-sustained plasma

US8259771B1 · kind B1 · utility

11Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 19, 2010
Grant dateSep 4, 2012
Priority date
Expiry dateDec 7, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J61/54
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A laser-sustained plasma light source with a bulb for enclosing a relatively cool gas environment, and an electrode disposed at least partially within the gas environment. A power supply applies a potential to the electrode, where the power supply is sufficient to create a corona discharge at the electrode within the gas environment, and the power supply is not sufficient to produce an arc discharge within the gas environment. The corona discharge thereby produces a relatively heated gas environment. A pump laser source focuses a laser beam within the gas environment, where the laser beam is sufficient to ignite a plasma in the relatively heated gas environment, but is not sufficient to ignite a plasma in the relatively cool gas environment.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.