Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography

US8263129B2 · kind B2 · utility

Assignee

• The University of North Carolina at Chapel Hill · US

Inventors

• Joseph M. DeSimone · Monte Sereno, US
• Jason P. Rolland · Redwood City, US
• Benjamin Maynor · Durham, US
• Larken E. Euliss · Craydon Court, US
• Ginger Denison Rothrock · Cary, US
• Ansley E. Dennis · Augusta, US
• Edward T. Samulski · Chapel Hill, US
• R. Jude Samulski · Chapel Hill, US

Key dates

• Filing date: Dec 20, 2004
• Grant date: Sep 11, 2012
• Expiry date: Jan 14, 2029

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/3154
• WIPO field: Pharmaceuticals
• WIPO sector: Chemistry

Abstract

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.