Photosensitive resin composition for color filter and color filter made using the same
US8263675B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2010 |
| Grant date | Sep 11, 2012 |
| Priority date | — |
| Expiry date | Jul 21, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a photosensitive resin composition for a color filter and a color filter fabricated using the same. The photosensitive resin composition includes (a) an acrylic-based resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, (d) a pigment, and (e) a solvent. The acrylic-based resin is a copolymer including a repeating unit of an ethylenic unsaturated monomer including a carboxyl group and a repeating unit of an ethylenic unsaturated monomer including an alkoxy 4-oxo butanoic acid group. The photosensitive resin composition for a color filter can have residue removing characteristics, and is capable of forming fine pixels and providing a color filter having high resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.