Photocurable perfluoropolyethers for use as novel materials in microfluidic devices
US8268446B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2004 |
| Grant date | Sep 18, 2012 |
| Priority date | — |
| Expiry date | Oct 1, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/3154
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
The use of a photocurable perfluoropolyether (PFPE) material for fabricating a solvent-resistant PFPE-based microfluidic device, methods of flowing a material and performing a chemical reaction in a solvent-resistant PFPE-based microfluidic device, and the solvent-resistant PFPE-based microfluidic devices themselves are described. In an embodiment, a method is described for preparing a patterned layer of a photocured perfluoropolyether, the method comprising: (a) providing a substrate, wherein the substrate comprises a patterned surface; (b) contacting a perfluoropolvether precursor with the patterned surface of the substrate; and (c) photocuring the perfluoropolyether precursor to form a patterned layer of a photocured perfluoropolyether.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.