Structure for pattern formation, method for pattern formation, and application thereof
US8268546B2 · kind B2 · utility
9Cited by
8References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 19, 2008 |
| Grant date | Sep 18, 2012 |
| Priority date | — |
| Expiry date | Sep 11, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.