Laser heated discharge plasma EUV source
US8269199B2 · kind B2 · utility
6Cited by
5References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 25, 2008 |
| Grant date | Sep 18, 2012 |
| Priority date | — |
| Expiry date | Aug 17, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.