Compensating for instrumentation overhead using execution environment overhead
US8271999B2 · kind B2 · utility
5Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2007 |
| Grant date | Sep 18, 2012 |
| Priority date | — |
| Expiry date | Nov 8, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F11/3612
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A computer implemented method, apparatus, and computer program code for profiling an application. Execution of an application is monitored. A set of metrics relating to execution of the application occurring during monitoring execution of the application are collected to form a set of observed metrics. An execution environment overhead occurring with respect to the set of observed events is identified to form an identified execution environment overhead. The set of observed metrics is adjusted using the identified execution environment overhead to form a set of calibrated metrics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.