Substrate processing apparatus
US8272826B2 · kind B2 · utility
1Cited by
11References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2008 |
| Grant date | Sep 25, 2012 |
| Priority date | — |
| Expiry date | Mar 23, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67161
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes first and second transfer chambers, first and second load lock chambers for exchanging one or more substrates with respective ones of first and the second transfer chambers, and a substrate transfer unit, located between the first and second load lock chambers, for transferring the one or more substrates to the first and second load lock chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.